点击可查看包含对应元素的相关产品信息

科泰新材料可提供“元索周期表”近乎全元素(除放射性元素外)的任意组合材料定制,
部分产品未及时更新,特殊定制需求请咨询客服。

产品中心

PRODUCTS

选择产品类别:

Element Sputtering Targets 取消选择
全部产品
产品类别

Titanium sputtering targets(Ti)

Titanium sputtering targets(Ti)
  • Titanium sputtering targets(Ti)
Titanium sputtering targets(Ti)基本信息
分子式Ti
纯度99.9%
CAS号7440-32-6
摩尔质量47.867
密度4.506 g·cm−3
熔点1941 K,1668 °C,3034 °F
沸点3560 K,3287 °C,5949 °F
溶解性(水)

Titanium sputtering targets(Ti)产品概况

Titanium sputtering targets(Ti)产品应用

High purity titanium is mainly used as a semiconductor material and as a getter material in ultra-high vacuum devices. High purity titanium has the ability to absorb gas, especially hydrogen, CH4, and Co2 gases, so it can be widely used in high vacuum and ultra-high vacuum systems. When using high-purity titanium sputtering to fabricate circuit networks, these integrated components can be made exceptionally light, thin, small in size, and circuit dense. High purity titanium targets can also be used as barrier metal materials.

产品需求

PRODUCT DEMAND

产品名称:

产品纯度:

产品尺寸:

您的昵称:

您的电话:

您的邮箱:

工作单位:

其他说明: