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Titanium sputtering targets(Ti)基本信息 | |
分子式 | Ti |
纯度 | 99.9% |
CAS号 | 7440-32-6 |
摩尔质量 | 47.867 |
密度 | 4.506 g·cm−3 |
熔点 | 1941 K,1668 °C,3034 °F |
沸点 | 3560 K,3287 °C,5949 °F |
溶解性(水) |
Titanium sputtering targets(Ti)产品应用 |
High purity titanium is mainly used as a semiconductor material and as a getter material in ultra-high vacuum devices. High purity titanium has the ability to absorb gas, especially hydrogen, CH4, and Co2 gases, so it can be widely used in high vacuum and ultra-high vacuum systems. When using high-purity titanium sputtering to fabricate circuit networks, these integrated components can be made exceptionally light, thin, small in size, and circuit dense. High purity titanium targets can also be used as barrier metal materials.