Germanium manganese alloy sputtering targets(GeMn)

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Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.

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Germanium manganese alloy sputtering targets(GeMn)essential information
Molecular formula	Ge-Mn
purity	99.9%
CAS No
Molar mass
density
melting point
boiling point
Solubility (water)

Germanium manganese alloy sputtering targets(GeMn)Product overview

Germanium manganese alloy sputtering targets(GeMn)Product application

Mn-doped magnetic semiconductors in Ge are currently a method of studying diluted magnetic semiconductors. Diluted magnetic semiconductors (DMS) have many novel characteristics, such as Faraday rotation, giant magnetoresistance, magneto-optic effect, etc. This doping method may realize the spin polarization of carriers, and has a wider application value in the current semiconductor industry integration.