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Sputtering Targets
- H氢
- He氦
- Li锂
- Be铍
- B硼
- C碳
- N氮
- O氧
- F氟
- Ne氖
- Na钠
- Mg镁
- Al铝
- Si硅
- P磷
- S硫
- Cl氯
- Ar氩
- K钾
- Ca钙
- Sc钪
- Ti钛
- V钒
- Cr铬
- Mn锰
- Fe铁
- Co钴
- Ni镍
- Cu铜
- Zn锌
- Ga镓
- Ge锗
- As砷
- Se硒
- Br溴
- Kr氪
- Rb铷
- Sr锶
- Y钇
- Zr锆
- Nb铌
- Mo钼
- Tc碍
- Ru钌
- Rh铑
- Pd钯
- Ag银
- Cd镉
- In铟
- Sn锡
- Sb锑
- Te碲
- I碘
- Xe氙
- Cs铯
- Ba钡
- LaLu镧系
- Hf铪
- Ta钽
- W钨
- Re铼
- Os锇
- Ir铱
- Pt铂
- Au金
- Hg汞
- Tl铊
- Pb铅
- Bi铋
- Po钋
- At砹
- Rn氡
- La镧
- Ce铈
- Pr镨
- Nd钕
- Pm钷
- Sm钐
- Eu铕
- Gd钆
- Tb铽
- Dy镝
- Ho钬
- Er铒
- Tm铥
- Yb镱
- Lu镥
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- Al铝
- Ar氩
- As砷
- Ag银
- Au金
- At砹
- Be铍
- B硼
- Br溴
- Ba钡
- Bi铋
- C碳
- Cl氯
- Ca钙
- Cr铬
- Co钴
- Cu铜
- Cd镉
- Cs铯
- Ce铈
- Dy镝
- Eu铕
- Er铒
- F氟
- Fe铁
- Ga镓
- Ge锗
- Gd钆
- H氢
- He氦
- Hf铪
- Hg汞
- Ho钬
- In铟
- I碘
- Ir铱
- K钾
- Kr氪
- Li锂
- LaLu镧系
- La镧
- Lu镥
- Mg镁
- Mn锰
- Mo钼
- N氮
- Ne氖
- Na钠
- Ni镍
- Nb铌
- Nd钕
- O氧
- Os锇
- P磷
- Pd钯
- Pt铂
- Pb铅
- Po钋
- Pr镨
- Pm钷
- Rb铷
- Re铼
- Rn氡
- Ru钌
- Rh铑
- Si硅
- S硫
- Sc钪
- Se硒
- Sr锶
- Sn锡
- Sb锑
- Te碲
- Sm钐
- Ti钛
- Tc碍
- Ta钽
- Tl铊
- Tb铽
- Tm铥
- V钒
- W钨
- Xe氙
- Yb镱
- Y钇
- Zn锌
- Zr锆
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Tungsten silicon alloy sputtering targets（WSi）
| Tungsten silicon alloy sputtering targets（WSi）基本信息 | |
| 分子式 | W-Si |
| 纯度 | 99.9% |
| CAS号 | |
| 摩尔质量 | |
| 密度 | |
| 熔点 | |
| 沸点 | |
| 溶解性（水） | |
Tungsten silicon alloy sputtering targets（WSi）产品概况
| Tungsten silicon alloy sputtering targets（WSi）产品应用 |
Tungsten silicon thin films have the characteristics of low resistivity, strong thermal stability, and excellent resistance to chemical corrosion. They are important components of semiconductor integrated circuits, and are mainly used as gate contact layers, diffusion barrier layers, or adhesive layers.
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