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silicon carbide Sputtering targets(SiC)

silicon carbide Sputtering targets(SiC)
  • silicon carbide Sputtering targets(SiC)
silicon carbide Sputtering targets(SiC)基本信息
分子式SiC
纯度99.5%
CAS号409-21-2
摩尔质量40.097
密度3.22 g/cm3
熔点
沸点
溶解性(水)

silicon carbide Sputtering targets(SiC)产品概况

silicon carbide Sputtering targets(SiC)产品应用

Silicon carbide is the third generation of semiconductor materials, with wide band gap, high thermal conductivity, high saturation drift velocity of electrons, high critical breakdown electric field, low dielectric constant, and good chemical stability. It has a wide range of applications in high-frequency, high-power, high-temperature, radiation resistant semiconductor devices and ultraviolet detector lamps.

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