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Sputtering Targets
- Element Sputtering Targets
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- Special Sputtering Targets Customization
- Sputtering Targets List
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Evaporation Materials
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- Oxide Evaporation Materials
- Nitride Evaporation Materials
- Carbide Evaporation Materials
- Fluoride Evaporation Materials
- Phosphide Evaporation Materials
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- Selenide Evaporation Materials
- Sulfide Evaporation Materials
- Other Evaporation Materials
- Evaporation Materials List
- Compound Semiconductor Materials
- Rare Earth Materials
- Special Alloy
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Crucible customization
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Sputtering Targets
- H氢
- He氦
- Li锂
- Be铍
- B硼
- C碳
- N氮
- O氧
- F氟
- Ne氖
- Na钠
- Mg镁
- Al铝
- Si硅
- P磷
- S硫
- Cl氯
- Ar氩
- K钾
- Ca钙
- Sc钪
- Ti钛
- V钒
- Cr铬
- Mn锰
- Fe铁
- Co钴
- Ni镍
- Cu铜
- Zn锌
- Ga镓
- Ge锗
- As砷
- Se硒
- Br溴
- Kr氪
- Rb铷
- Sr锶
- Y钇
- Zr锆
- Nb铌
- Mo钼
- Tc碍
- Ru钌
- Rh铑
- Pd钯
- Ag银
- Cd镉
- In铟
- Sn锡
- Sb锑
- Te碲
- I碘
- Xe氙
- Cs铯
- Ba钡
- LaLu镧系
- Hf铪
- Ta钽
- W钨
- Re铼
- Os锇
- Ir铱
- Pt铂
- Au金
- Hg汞
- Tl铊
- Pb铅
- Bi铋
- Po钋
- At砹
- Rn氡
- La镧
- Ce铈
- Pr镨
- Nd钕
- Pm钷
- Sm钐
- Eu铕
- Gd钆
- Tb铽
- Dy镝
- Ho钬
- Er铒
- Tm铥
- Yb镱
- Lu镥
点击可查看包含对应元素的相关产品信息
科泰新材料可提供“元索周期表”近乎全元素(除放射性元素外)的任意组合材料定制，
部分产品未及时更新，特殊定制需求请咨询客服。
- Al铝
- Ar氩
- As砷
- Ag银
- Au金
- At砹
- Be铍
- B硼
- Br溴
- Ba钡
- Bi铋
- C碳
- Cl氯
- Ca钙
- Cr铬
- Co钴
- Cu铜
- Cd镉
- Cs铯
- Ce铈
- Dy镝
- Eu铕
- Er铒
- F氟
- Fe铁
- Ga镓
- Ge锗
- Gd钆
- H氢
- He氦
- Hf铪
- Hg汞
- Ho钬
- In铟
- I碘
- Ir铱
- K钾
- Kr氪
- Li锂
- LaLu镧系
- La镧
- Lu镥
- Mg镁
- Mn锰
- Mo钼
- N氮
- Ne氖
- Na钠
- Ni镍
- Nb铌
- Nd钕
- O氧
- Os锇
- P磷
- Pd钯
- Pt铂
- Pb铅
- Po钋
- Pr镨
- Pm钷
- Rb铷
- Re铼
- Rn氡
- Ru钌
- Rh铑
- Si硅
- S硫
- Sc钪
- Se硒
- Sr锶
- Sn锡
- Sb锑
- Te碲
- Sm钐
- Ti钛
- Tc碍
- Ta钽
- Tl铊
- Tb铽
- Tm铥
- V钒
- W钨
- Xe氙
- Yb镱
- Y钇
- Zn锌
- Zr锆
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- 产品类别
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Tungsten silicon alloy sputtering targets（WSi）
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Indium oxide doped molybdenum oxide (IMO) sputtering targets In2O3-MoO3
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Tantalum nickel alloy sputtering targets（TaNi）
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Aluminum titanium manganese alloy sputtering targets(AlTiMn)
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Aluminium zirconium yttrium alloy sputtering targets(AlZrY)
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Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)
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Aluminum nickel chromium alloy sputtering targets（AlNiCr）
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Tantalum doped molybdenum disulfide sputtering targets（MoS2-Ta）
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Bismuth sputtering targets(Bi)
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