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Titanium dioxide doped with vanadium sputtering targets(TiO2-V)
Tin monoxide sputtering targets(SnO)
Molybdenum silicon aluminum sputtering targets(MoSiAl)
Copper tin alloy sputtering targets(CuSn)
Nickel tungsten alloy sputtering targets(NiW)
Bismuth terbium ferrite sputtering targets(BiTb2Fe5O12)
Germanium manganese alloy sputtering targets(GeMn)
Calcium tungstate sputtering targets(CaWO4)
Bismuth antimony tellurium sputtering targets(BiSbTe)